Method and system for generating aluminum ions

Ion implantation devices, systems, and methods are described, and in particular, an ion source that can be used to generate an aluminum ion beam is described. 本发明描述离子植入装置、系统及方法，且特定来说，本发明描述一种可用于产生铝离子束的离子源。

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Bibliographic Details
Main Authors CHAMBERS BARRY LEWIS, DESPRES JOSEPH R, TANG YING, BYL OLEG, SWEENEY JOSEPH D
Format Patent
LanguageChinese
English
Published 23.06.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:Ion implantation devices, systems, and methods are described, and in particular, an ion source that can be used to generate an aluminum ion beam is described. 本发明描述离子植入装置、系统及方法，且特定来说，本发明描述一种可用于产生铝离子束的离子源。
Bibliography:Application Number: CN202180066316