Micro-nano pulse plasma metal-based material modification system
The invention provides a micro-nano pulse plasma metal-based material modification system, which comprises a beam source assembly, which is internally provided with a beam source inner cavity and can generate a high-energy beam; the vacuum cabin is arranged below the beam source assembly, the interi...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
02.06.2023
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Subjects | |
Online Access | Get full text |
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Summary: | The invention provides a micro-nano pulse plasma metal-based material modification system, which comprises a beam source assembly, which is internally provided with a beam source inner cavity and can generate a high-energy beam; the vacuum cabin is arranged below the beam source assembly, the interior of the vacuum cabin is a vacuum space, the vacuum space is communicated with the beam source inner cavity, an electrostatic focusing device, an electrostatic deflection device and a motion platform are sequentially arranged in the vacuum space from top to bottom, and the motion platform is used for fixing a workpiece and driving the workpiece to move. The high-energy beam entering the vacuum space is focused by the electrostatic focusing device and deflected and adjusted by the electrostatic deflection device to reach the surface layer of the workpiece to realize modification of the micro-nano layer on the surface of the workpiece; and the top of the supporting platform is provided with the vacuum cabin to suppo |
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Bibliography: | Application Number: CN202310226647 |