Silicon dioxide dispersion, preparation method thereof, resin composition and application thereof

• Main Authors: CHEN JIANXIONG, GUO YONGJUN, WEN WENYAN
• Format: Patent
• Language: Chinese; English
• Published: 14.04.2023
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMISTRY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS

The invention relates to a silicon dioxide dispersion and a preparation method thereof, and a resin composition and application thereof, the silicon dioxide dispersion comprises the following components by mass: 50-80 parts of silicon dioxide, 0.2-1 part of a wetting agent, 0.3-1 part of a silane coupling agent, 0.5-2 parts of a dispersant, and 16-49 parts of a solvent; the wetting agent is selected from at least one of a polyether modified polysiloxane wetting agent with a twin structure and a polyether modified polydimethylsiloxane wetting agent with hydroxyl, and the mass ratio of the wetting agent to the silicon dioxide is 1: (100-160). According to the silicon dioxide dispersion, the specific type of wetting agent is adopted to act with the silicon dioxide, further act with the silane coupling agent and the dispersing agent, and control the proportion of all the components, especially the adding amount of the wetting agent, so that the silicon dioxide dispersion is relatively high in solid content and re