Preparation method of cleaning agent for removing high-temperature oxide skin and few organic films of OLED evaporation plate

The invention discloses a preparation method of a cleaning agent for removing high-temperature oxide skin and a small amount of organic films of an OLED evaporation plate. The cleaning agent comprises multifunctional auxiliaries such as main acid, auxiliary acid, an antirust agent, a Fe < 3 + >...

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Main Authors EBISU JIALIANG, TANG XIAOMING
Format Patent
LanguageChinese
English
Published 25.11.2022
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Abstract The invention discloses a preparation method of a cleaning agent for removing high-temperature oxide skin and a small amount of organic films of an OLED evaporation plate. The cleaning agent comprises multifunctional auxiliaries such as main acid, auxiliary acid, an antirust agent, a Fe < 3 + > complexing agent, an emulsifier, a wetting agent and a fog inhibitor, an organic film cleaning agent, a corrosion inhibition inhibitor and deionized water. After the main acid, the auxiliary acid, the antirust agent, the Fe < 3 + > complexing agent, the emulsifier, the wetting agent, the fog inhibitor, the organic film cleaning agent and the corrosion inhibition inhibitor are fully stirred and uniformly mixed through the deionized water to form the cleaning agent, an evaporation plate baked at a high temperature is taken to be cleaned. Before cleaning, a layer of yellowish-brown oxide and a few organic residual films exist on the surface of the component, after cleaning and regeneration are conducted through a cleaning
AbstractList The invention discloses a preparation method of a cleaning agent for removing high-temperature oxide skin and a small amount of organic films of an OLED evaporation plate. The cleaning agent comprises multifunctional auxiliaries such as main acid, auxiliary acid, an antirust agent, a Fe < 3 + > complexing agent, an emulsifier, a wetting agent and a fog inhibitor, an organic film cleaning agent, a corrosion inhibition inhibitor and deionized water. After the main acid, the auxiliary acid, the antirust agent, the Fe < 3 + > complexing agent, the emulsifier, the wetting agent, the fog inhibitor, the organic film cleaning agent and the corrosion inhibition inhibitor are fully stirred and uniformly mixed through the deionized water to form the cleaning agent, an evaporation plate baked at a high temperature is taken to be cleaned. Before cleaning, a layer of yellowish-brown oxide and a few organic residual films exist on the surface of the component, after cleaning and regeneration are conducted through a cleaning
Author TANG XIAOMING
EBISU JIALIANG
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DocumentTitleAlternate 一种去除OLED蒸镀板高温氧化皮和少量有机膜的清洗剂的制备方法
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RelatedCompanies ANHUI YINGYOU OPTOELECTRONIC TECHNOLOGY CO., LTD
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Snippet The invention discloses a preparation method of a cleaning agent for removing high-temperature oxide skin and a small amount of organic films of an OLED...
SourceID epo
SourceType Open Access Repository
SubjectTerms ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES
CANDLES
CHEMISTRY
DETERGENT COMPOSITIONS
DETERGENTS
FATTY ACIDS THEREFROM
METALLURGY
RECOVERY OF GLYCEROL
RESIN SOAPS
SOAP OR SOAP-MAKING
USE OF SINGLE SUBSTANCES AS DETERGENTS
Title Preparation method of cleaning agent for removing high-temperature oxide skin and few organic films of OLED evaporation plate
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