Preparation method of cleaning agent for removing high-temperature oxide skin and few organic films of OLED evaporation plate
The invention discloses a preparation method of a cleaning agent for removing high-temperature oxide skin and a small amount of organic films of an OLED evaporation plate. The cleaning agent comprises multifunctional auxiliaries such as main acid, auxiliary acid, an antirust agent, a Fe < 3 + >...
Saved in:
Main Authors | , |
---|---|
Format | Patent |
Language | Chinese English |
Published |
25.11.2022
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | The invention discloses a preparation method of a cleaning agent for removing high-temperature oxide skin and a small amount of organic films of an OLED evaporation plate. The cleaning agent comprises multifunctional auxiliaries such as main acid, auxiliary acid, an antirust agent, a Fe < 3 + > complexing agent, an emulsifier, a wetting agent and a fog inhibitor, an organic film cleaning agent, a corrosion inhibition inhibitor and deionized water. After the main acid, the auxiliary acid, the antirust agent, the Fe < 3 + > complexing agent, the emulsifier, the wetting agent, the fog inhibitor, the organic film cleaning agent and the corrosion inhibition inhibitor are fully stirred and uniformly mixed through the deionized water to form the cleaning agent, an evaporation plate baked at a high temperature is taken to be cleaned. Before cleaning, a layer of yellowish-brown oxide and a few organic residual films exist on the surface of the component, after cleaning and regeneration are conducted through a cleaning |
---|---|
Bibliography: | Application Number: CN202210641666 |