High-speed and high-precision alignment laser direct writing photoetching method and device

• Main Authors: ZHANG JIACHEN, KUANG CUIFANG, ZHAN LANXIN, SHEN XIAOMING, MA CHENGPENG, TANG MENGBO, CAO CHUN, YANG ZHENYAO, WANG HONGQING, SUN QI, LIU XU
• Format: Patent
• Language: Chinese; English
• Published: 11.11.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention discloses a high-speed and high-precision alignment laser direct writing photoetching method and device, which uses a displacement table and rotating mirror synchronous motion algorithm, and comprises the following steps: firstly, generating a laser beam based on a laser, realizing high-speed modulation of laser intensity based on an electro-optical/acousto-optic modulator, and generating high-speed modulation signal control based on an arbitrary waveform generator; then starting the displacement table, moving according to a preset path, and generating a trigger signal when passing through a preset trigger position; a trigger signal is acquired based on a data acquisition card, a rotating mirror trigger laser is turned on after triggering, and a rotating mirror scanning starting point signal is acquired based on the rotating mirror position laser and used for starting an arbitrary waveform generator to output a high-speed modulation signal; and finally, the displacement table moves to the next t