Component for plasma processing apparatus, method for manufacturing same, and plasma processing apparatus

• Main Authors: KATASE TAKUMA, SHIONO ICHIRO, KURATA YUTO, ISHIKAWA FUMIAKI, YASOSHIMA TSUKASA
• Format: Patent
• Language: Chinese; English
• Published: 14.10.2022
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

This member (10, 22) for a plasma processing device is characterized by having a base material (12, 23) and a heat-conducting layer (13, 24) provided on one surface of the base material, and the heat-conducting layer (13, 24) contains at least one of a fluorine-based resin and a fluorine-based elastomer. 该等离子体处理装置用部件(10，22)的特征在于，具有基材(12，23)和设置在所述基材的一面的导热层(13，24)，所述导热层(13，24)包含氟系树脂及氟系弹性体中的至少一者。