Component for plasma processing apparatus, method for manufacturing same, and plasma processing apparatus
This member (10, 22) for a plasma processing device is characterized by having a base material (12, 23) and a heat-conducting layer (13, 24) provided on one surface of the base material, and the heat-conducting layer (13, 24) contains at least one of a fluorine-based resin and a fluorine-based elast...
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Main Authors | , , , , |
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Format | Patent |
Language | Chinese English |
Published |
14.10.2022
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Subjects | |
Online Access | Get full text |
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Summary: | This member (10, 22) for a plasma processing device is characterized by having a base material (12, 23) and a heat-conducting layer (13, 24) provided on one surface of the base material, and the heat-conducting layer (13, 24) contains at least one of a fluorine-based resin and a fluorine-based elastomer.
该等离子体处理装置用部件(10,22)的特征在于,具有基材(12,23)和设置在所述基材的一面的导热层(13,24),所述导热层(13,24)包含氟系树脂及氟系弹性体中的至少一者。 |
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Bibliography: | Application Number: CN202180017626 |