Wafer far edge temperature measurement system with light row alignment

• Main Authors: NAIK RAJENDRA, HUANG SHAOMENG, SU JUNWEI, LIN XING
• Format: Patent
• Language: Chinese; English
• Published: 11.10.2022
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COLORIMETRY; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT; MEASURING; METALLURGY; PHYSICS; RADIATION PYROMETRY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TESTING

A reactor system is designed to provide precise monitoring of wafer temperature during a deposition step. The reactor system includes a pyrometer mounting assembly that supports and positions three or more pyrometers (e.g., infrared (IR) pyrometers) relative to the reaction chamber to measure a center wafer temperature and an edge wafer temperature as well as a reaction chamber temperature. The pyrometer mounting assembly provides a small spot size or temperature sensing area for the edge pyrometer to accurately measure the edge wafer temperature. A clamp assembly and mounting method for each tool setting is provided for enabling precise alignment of IR pyrometer sensing spots (and edge pyrometers) relative to a wafer when the pyrometer mounting assembly is mounted on a lamp bank in a reactor system or tool setting. Wafer edge temperature sensing with reactor systems assembled in appropriate alignment ensures accurate and repeatable measurement of wafer temperature. 一种反应器系统，设计用于在沉积步骤中提供对晶片温度的精确监测。反应器系统包括高温计安装