SEMICONDUCTOR DEVICE AND ELECTRONIC SYSTEM INCLUDING THE SAME
The invention provides a semiconductor device and an electronic system including the same. A semiconductor device includes: a peripheral circuit layer on a substrate; a lower stack and an upper stack on the substrate; a stopper layer on the upper stack and including an insulating material; an upper...
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Main Authors | , , , , |
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Format | Patent |
Language | Chinese English |
Published |
24.06.2022
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Subjects | |
Online Access | Get full text |
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Abstract | The invention provides a semiconductor device and an electronic system including the same. A semiconductor device includes: a peripheral circuit layer on a substrate; a lower stack and an upper stack on the substrate; a stopper layer on the upper stack and including an insulating material; an upper mold layer on the stopper layer; a unit channel structure extending through the lower stack, the upper stack, the stopper layer, and the upper mold layer, a side surface of the unit channel structure contacting the stopper layer; a first cover layer and a second cover layer; a word line separation structure including a protrusion protruding toward the stopper layer; and a bit line contact plug connected to the cell channel structure, wherein an inner side surface of the stopper layer is offset from an inner side surface of the upper stack and is in contact with the word line separation structure.
本公开提供了半导体器件以及包括该半导体器件的电子系统。一种半导体器件包括:在基板上的外围电路层;在基板上的下堆叠和上堆叠;停止物层,在上堆叠上并包括绝缘材料;在停止物层上的上模具层;延伸穿过下堆叠、上堆叠、停止物层和上模具层的单元沟道结构, |
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AbstractList | The invention provides a semiconductor device and an electronic system including the same. A semiconductor device includes: a peripheral circuit layer on a substrate; a lower stack and an upper stack on the substrate; a stopper layer on the upper stack and including an insulating material; an upper mold layer on the stopper layer; a unit channel structure extending through the lower stack, the upper stack, the stopper layer, and the upper mold layer, a side surface of the unit channel structure contacting the stopper layer; a first cover layer and a second cover layer; a word line separation structure including a protrusion protruding toward the stopper layer; and a bit line contact plug connected to the cell channel structure, wherein an inner side surface of the stopper layer is offset from an inner side surface of the upper stack and is in contact with the word line separation structure.
本公开提供了半导体器件以及包括该半导体器件的电子系统。一种半导体器件包括:在基板上的外围电路层;在基板上的下堆叠和上堆叠;停止物层,在上堆叠上并包括绝缘材料;在停止物层上的上模具层;延伸穿过下堆叠、上堆叠、停止物层和上模具层的单元沟道结构, |
Author | SONG HYUN-JOO LI HUIMEI GAO SHENGCAI PARK SUN-JOONG PARK HAN-YONG |
Author_xml | – fullname: PARK HAN-YONG – fullname: LI HUIMEI – fullname: PARK SUN-JOONG – fullname: SONG HYUN-JOO – fullname: GAO SHENGCAI |
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DocumentTitleAlternate | 半导体器件以及包括该半导体器件的电子系统 |
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Snippet | The invention provides a semiconductor device and an electronic system including the same. A semiconductor device includes: a peripheral circuit layer on a... |
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Title | SEMICONDUCTOR DEVICE AND ELECTRONIC SYSTEM INCLUDING THE SAME |
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