DEVICE FOR APPLYING A LIQUID MEDIUM RADIATED WITH UV RADIATION TO A SUBSTRATE

• Main Authors: GRABITZ PETER, DREES, PETER, DIETZ UWE
• Format: Patent
• Language: Chinese; English
• Published: 24.06.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; CLEANING; CLEANING IN GENERAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PREVENTION OF FOULING IN GENERAL; SEMICONDUCTOR DEVICES; TRANSPORTING

Disclosed is an apparatus for applying a liquid medium charged with UV radiation to a substrate, having: a housing having an elongated chamber, having at least one inlet opening open towards the chamber, and having a slot-like outlet opening positioned opposite the at least one inlet opening and extending over the length of the chamber; a tube element extending through the chamber in the longitudinal direction and being at least partially transparent to UV radiation, the tube element being arranged in the chamber such that a flow space is formed between the tube element and a wall of the chamber, the flow space being symmetrical with respect to a longitudinal center plane of the chamber, the longitudinal center plane centrally penetrating the outlet opening, and such that the tube element extends into a slot-like outlet opening in the housing, and thereby two outlet slots are formed between the tube element and the housing, which extend in the longitudinal direction; and at least one UV radiation source in th