Synthetic method of acrylate resin monomer for 193nm photoresist

• Main Authors: ZHANG CHEN, DU ZHAOLEI, SUN JIAWEI, SONG YANG, WANG JINGYUN, LI SHILEI
• Format: Patent
• Language: Chinese; English
• Published: 31.05.2022
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; ELECTROGRAPHY; HETEROCYCLIC COMPOUNDS; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention relates to a synthetic method of an acrylate resin monomer for 193nm photoresist, which comprises the following steps: by taking vinyl acrylate or vinyl methacrylate and alcohol as reaction raw materials and a small-polarity alkane solvent as a reaction solvent, adding a polymerization...