Synthetic method of acrylate resin monomer for 193nm photoresist

• Main Authors: ZHANG CHEN, DU ZHAOLEI, SUN JIAWEI, SONG YANG, WANG JINGYUN, LI SHILEI
• Format: Patent
• Language: Chinese; English
• Published: 31.05.2022
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; ELECTROGRAPHY; HETEROCYCLIC COMPOUNDS; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention relates to a synthetic method of an acrylate resin monomer for 193nm photoresist, which comprises the following steps: by taking vinyl acrylate or vinyl methacrylate and alcohol as reaction raw materials and a small-polarity alkane solvent as a reaction solvent, adding a polymerization inhibitor, and taking alkaline ion exchange resin as a catalyst, carrying out ester exchange under a low-temperature condition to obtain acrylate. According to the synthetic method of the acrylate resin monomer for the 193nm photoresist, the reaction process is simple to operate, the reaction is efficient and safe, and the synthetic method is a process route suitable for industrial production. 本发明涉及一种193nm光刻胶用丙烯酸酯树脂单体的合成方法，以丙烯酸乙烯酯或甲基丙烯酸乙烯酯以及醇为反应原料，以小极性的烷烃溶剂为反应溶剂，加入阻聚剂，用碱性的离子交换树脂作为催化剂，在低温条件下通过酯交换得到丙烯酸酯。本发明提出了的193nm光刻胶用丙烯酸酯树脂单体的合成方法，反应过程操作简单，反应高效、安全，是一条可以适用于工业化生产的工艺路线。