Vapor chamber device and manufacturing method thereof

• Main Authors: CHEN YINGZHU, LIN PURU, GUO JIHAI, YE WEIQI, KE ZHENGDA
• Format: Patent
• Language: Chinese; English
• Published: 10.05.2022
• Subjects: BLASTING; CALCULATING; COMPUTING; COUNTING; DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OFGENERAL APPLICATION; ELECTRIC DIGITAL DATA PROCESSING; HEAT EXCHANGE IN GENERAL; HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS,IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT; HEATING; LIGHTING; MECHANICAL ENGINEERING; PHYSICS; WEAPONS

The invention relates to a vapor chamber device and a manufacturing method thereof. The vapor chamber device comprises a shell and a plurality of independent cavities, the shell comprises a first plate part and a second plate part which are oppositely arranged; the cavity is formed between the first plate part and the second plate part; each cavity is internally provided with an actuating liquid, at least one flow guide convex block and a capillary structure, the flow guide convex block is formed on the inner surface of the second plate part, and the capillary structure is arranged at the tail end of the flow guide convex block; due to the fact that the cavities are independent of one another and are all provided with the actuating liquid, when the vapor chamber device is perpendicularly arranged on the side edge of a heat source, the actuating liquid still exists in the upper cavity in the vapor chamber device, the actuating liquid cannot be completely concentrated to the lower portion of the vapor chamber d