ELECTROSTATIC CHUCK FOR HIGH BIAS RADIO FREQUENCY (RF) POWER APPLICATION IN PLASMA PROCESSING CHAMBER

• Main Authors: TIAN PENG, JO JAE-RYONG, RAUF SHAHID
• Format: Patent
• Language: Chinese; English
• Published: 01.10.2021
• Subjects: BASIC ELECTRIC ELEMENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOTDIRECTED TO A PARTICULAR RESULT; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER; DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g.ARRANGEMENTS FOR COPYING OR CONTROLLING; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GENERATION; MACHINE TOOLS; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OFPARTICULAR DETAILS OR COMPONENTS; METAL-WORKING NOT OTHERWISE PROVIDED FOR; PERFORMING OPERATIONS; SEMICONDUCTOR DEVICES; TRANSPORTING

Embodiments of an electrostatic chuck are provided herein. In some embodiments, an electrostatic chuck for use in a substrate processing chamber includes a plate having a first side and a second side opposite the first side, a first electrode embedded in the plate proximate the first side, a second electrode embedded in the plate proximate the second side, a plurality of conductive elements coupling the first electrode to the second electrode, a first gas channel disposed within the plate and between the first electrode and the second electrode, a gas inlet extending from the second side of the plate to the first gas channel; and a plurality of gas outlets extending from the first side of the plate to the first gas channel. 此处提供静电卡盘的实施例。在一些实施例中，一种在基板处理腔室中使用的静电卡盘，包括：板，具有第一侧和与第一侧相对的第二侧；第一电极，嵌入板中靠近第一侧；第二电极，嵌入板中靠近第二侧；多个导电元件，将第一电极耦合至第二电极；第一气体通道，设置于板内并且介于第一电极及第二电极之间；气体入口，从板的第二侧延伸至第一气体通道；以及多个气体出口，从板的第一侧延伸至第一气体通道。