Method and apparatus for treating discharge gas containing target gas in plasma state

• Main Authors: JANG YUN-SANG, PAEK KWANG-HYON, JU WON-TAE
• Format: Patent
• Language: Chinese; English
• Published: 16.04.2021
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; SEPARATION; TRANSPORTING

The present invention relates to a method and apparatus for treating a discharge gas containing a target gas in a plasma state, the method comprising the steps of: generating a plasma in a conversion region in which the conversion of the target gas occurs; supplying, to the conversion region, a conv...