TIME-DOMAIN OPTICAL METROLOGY AND INSPECTION OF SEMICONDUCTOR DEVICES

Semiconductor device metrology including creating a time-domain representation of wavelength-domain measurement data of light reflected by a patterned structure of a semiconductor device, selecting anearlier-in-time portion of the time-domain representation that excludes a later-in-time portion of t...

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Bibliographic Details
Main Authors BARAK GILAD, HAINICK YAIR, SHIRMAN YURI, LEVANT BORIS, SHAFIR DROR, SCHLEIFER ELAD, AMA MICHAEL, FERBER SMADAR, LINDENFELD ZE'EV
Format Patent
LanguageChinese
English
Published 12.02.2021
Subjects
COLORIMETRY
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
RADIATION PYROMETRY
TESTING
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Summary:Semiconductor device metrology including creating a time-domain representation of wavelength-domain measurement data of light reflected by a patterned structure of a semiconductor device, selecting anearlier-in-time portion of the time-domain representation that excludes a later-in-time portion of the time-domain representation, and determining one or more measurements of one or more parameters of interest of the patterned structure by performing model-based processing using the earlier-in-time portion of the time-domain representation. 半导体器件计量，包括：创建由半导体器件的图案化结构反射的光的波长域测量数据的时域表示；选择排除了时域表示的时间较晚部分的时域表示的时间较早部分；以及通过使用时域表示的时间较早部分执行基于模型的处理来确定图案化结构的一个或多个感兴趣参数的一个或多个测量。
Bibliography:Application Number: CN201980043924