SEMICONDUCTOR NANOPARTICLES, METHOD FOR PRODUCING SAME, AND LIGHT-EMITTING DEVICE
Provided is a method for producing semiconductor nanoparticles that exhibit band-edge emission and have a superior quantum yield. This method for producing semiconductor nanoparticles comprises: raising the temperature of a first mixture containing a salt of Ag, a salt containing In and/or Ga, a sol...
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Main Authors | , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
20.10.2020
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Subjects | |
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Abstract | Provided is a method for producing semiconductor nanoparticles that exhibit band-edge emission and have a superior quantum yield. This method for producing semiconductor nanoparticles comprises: raising the temperature of a first mixture containing a salt of Ag, a salt containing In and/or Ga, a solid compound that serves as a source for supplying S, and an organic solvent, to a temperature in therange of 125-175 DEG C; following the raising of the temperature, subjecting the mixture to a thermal treatment at a temperature in the range of 125-175 DEG C for 3 seconds or longer, to obtain a solution containing semiconductor nanoparticles; and, following the thermal treatment, lowering the temperature of the solution containing the semiconductor nanoparticles, wherein the solid compound serving as a source for supplying S contains thiourea.
本发明提供一种呈现带边发射,量子产率优异的半导体纳米粒子的制造方法。半导体纳米粒子的制造方法,包括如下内容:将含有Ag的盐、含In和Ga中的至少一种的盐、作为S的供给源的固体状化合物、和有机溶剂的第一混合物,升温至处于125℃以上且175℃以下的范围的温度;继所述升温之后,以处于125℃以上且175℃以下的范围的温度,对于所述混合物进行3秒以上热 |
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AbstractList | Provided is a method for producing semiconductor nanoparticles that exhibit band-edge emission and have a superior quantum yield. This method for producing semiconductor nanoparticles comprises: raising the temperature of a first mixture containing a salt of Ag, a salt containing In and/or Ga, a solid compound that serves as a source for supplying S, and an organic solvent, to a temperature in therange of 125-175 DEG C; following the raising of the temperature, subjecting the mixture to a thermal treatment at a temperature in the range of 125-175 DEG C for 3 seconds or longer, to obtain a solution containing semiconductor nanoparticles; and, following the thermal treatment, lowering the temperature of the solution containing the semiconductor nanoparticles, wherein the solid compound serving as a source for supplying S contains thiourea.
本发明提供一种呈现带边发射,量子产率优异的半导体纳米粒子的制造方法。半导体纳米粒子的制造方法,包括如下内容:将含有Ag的盐、含In和Ga中的至少一种的盐、作为S的供给源的固体状化合物、和有机溶剂的第一混合物,升温至处于125℃以上且175℃以下的范围的温度;继所述升温之后,以处于125℃以上且175℃以下的范围的温度,对于所述混合物进行3秒以上热 |
Author | KUWABATA SUSUMU OYAMATSU DAISUKE WAJIMA KAZUTAKA UEMATSU TARO KAMEYAMA TATSUYA TORIMOTO TSUKASA |
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DocumentTitleAlternate | 半导体纳米粒子、其制造方法和发光器件 |
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Snippet | Provided is a method for producing semiconductor nanoparticles that exhibit band-edge emission and have a superior quantum yield. This method for producing... |
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SubjectTerms | ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INORGANIC CHEMISTRY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NANOTECHNOLOGY NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES SEMICONDUCTOR DEVICES SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING |
Title | SEMICONDUCTOR NANOPARTICLES, METHOD FOR PRODUCING SAME, AND LIGHT-EMITTING DEVICE |
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