SPUTTERING TARGET CAPABLE OF DISCHARGING STEADILY

• Main Authors: IWABUCHI YASUYUKI, OGINO SHIN-ICHI
• Format: Patent
• Language: Chinese; English
• Published: 08.05.2020
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Provided is a ferromagnetic material sputtering target which can achieve steady discharging with a magnetron sputtering device, is reduced in the generation of particles during sputtering, and has improved magnetic flux leakage. A sputtering target comprising (A) multiple metal particles each comprising Co or a Co alloy and (B) a composite phase in which Co or a Co alloy that fills gaps among themultiple metal particles and a metal oxide are dispersed in each other, wherein the difference between the Co concentration in the Co or the Co alloy constituting the multiple metal particles (A) andthe Co concentration in the Co or the Co alloy constituting the composite phase (B) is 5 at% or less and the ratio of the area of the multiple metal particles to the total area of the multiple metal particles (A) and the composite phase (B) is 20 to 65%. 提供一种强磁性材料溅射靶，在磁控溅射装置能够获得稳定的放电，并且溅射时的颗粒产生少，提高了漏磁通。溅射靶具备由Co或Co合金构成的多个金属粒子(A)、以及填埋在该多个金属粒子间的隙间中的Co或Co合金与金属氧化物相互彼此分散的复合相(B)，构成多个金属粒子(A)的Co或Co合金中的Co浓度与构成复合相(B)的Co或Co合金中的Co浓度之差为