HIGH THROUGHPUT, HIGH RESOLUTION OPTICAL METROLOGY FOR REFLECTIVE AND TRANSMISSIVE NANOPHOTONIC DEVICES

• Main Authors: GAWLIK BRIAN, SREENIVASAN S V, SINGHAL SHRAWAN
• Format: Patent
• Language: Chinese; English
• Published: 16.08.2019
• Subjects: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; NANOTECHNOLOGY; PERFORMING OPERATIONS; PHYSICS; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; TESTING; TRANSPORTING

The present disclosure relates to optical metrology for nanophotonic devices. A metrology system according to this disclosure includes a sample camera and a reference camera each connected to at leastone computer configured with a computer processor and computerized memory. A tunable light source is directed to a nanophotonic device subject to imaging by the sample camera, and a reference light source subject to imaging by the reference camera to record reference lighting parameters in the memory. The computerized memory stores computer readable software commands that gather respective sets of image data from the sample camera and the reference camera to identify at least one nanophotonic property of the nanophotonic device by comparing the respective sets of image data. Examples show metrology for wire grid polarizers and other devices fabricated in wafer scale or roll to roll assemblies 本公开内容涉及用于纳米光子器件的光学计量。根据本公开内容的计量系统包括样本相机和参考相机，每个相机连接到配置有计算机处理器和计算机化存储器的至少一个计算机。可调光源被引导到经受样本相机成像的纳米光子器件，并且参考光源经受所述参考相机成像以在存储