Method for generating mask pattern model and method for optimizing mask pattern

• Main Authors: ZHAO YUHANG, CHEN SHOUMIAN, SHI XUELONG, LI MING
• Format: Patent
• Language: Chinese; English
• Published: 05.07.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention provides a method for generating a mask pattern model and a method for optimizing a mask pattern. The method for generating the mask pattern model comprises the following steps: S11, calculating an intrinsic function group under a set photoetching process condition, wherein the intrinsic function group comprises n intrinsic functions; s12, obtaining an imaging signal value set at each defined position of each test pattern, wherein the imaging signal value set comprises n imaging signal values, and each imaging signal value is calculated based on the convolution value of the intrinsic function and the optical transmission function in the intrinsic function group; S13, taking the imaging signal value set at each defined position of each test pattern as the input of a neural network model; S14, calculating a continuous tone mask pattern of each test pattern, and taking the continuous tone mask pattern as an output training target of the neural network model; S15, training parameters of the neural n