VERY HIGH CAPACITANCE FILM CAPACITOR AND METHOD FOR THE PRODUCTION OF SAME

The present invention relates in particular to a very high capacitance film capacitor (1) that comprises a dielectric layer (100) consisting of at least one dielectric film (100a,..., 100i), each dielectric film (100a,..., 100i) of this dielectric layer (100) having the following parameters: a relat...

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Bibliographic Details
Main Author DEPOND JEAN-MICHEL
Format Patent
LanguageChinese
English
Published 04.06.2019
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Summary:The present invention relates in particular to a very high capacitance film capacitor (1) that comprises a dielectric layer (100) consisting of at least one dielectric film (100a,..., 100i), each dielectric film (100a,..., 100i) of this dielectric layer (100) having the following parameters: a relative dielectric permittivity [(epsilon)fi] such that [epsilon]fi>=10, a thickness [efi] such that 0.05 [mu]m<=efi<=50 [mu]m, a dielectric strength [Efi] such that Efi>=50 V/[mu]m, parameters in which f signifies film and i>=1, i designating the ith dielectric film (100i) of said dielectric layer (100), this dielectric layer (100) separating a first electronic charge carrier structure (200) from a second electronic charge carrier structure (300), these two structures having an opposite surface (S)separated by the dielectric layer(100). 本发明特别涉及一种甚高电容的膜电容器(1),其包括由至少一个介电膜(100a,...,100i)构成的介电层(100),该介电层(100)的每个介电膜(100a,...,100i)具有以下参数:-相对介电常数使得-厚度[e]使得0.05μm≤e≤50μm,-介电强度使得在参数中"f"表示"膜"且i≥1的参数,"i"表示所述介电层(100)的"第i"介电膜(100i)
Bibliography:Application Number: CN201780061154