SYSTEMS AND PROCESSES FOR PLASMA FILTERING

• Main Authors: LUBOMIRSKY DMITRY, PARK SOONAM, TRAN TOAN Q, KALNIN NIKOLAI, DEVARAKONDA AKHIL
• Format: Patent
• Language: Chinese; English
• Published: 30.04.2019
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Systems and methods may be used to enact plasma filtering. Exemplary processing chambers may include a showerhead. The processing chambers may include a substrate support. The processing chambers mayinclude a power source electrically coupled with the substrate support and configured to provide power to the substrate support to produce a bias plasma within a processing region defined between theshowerhead and the substrate support. The processing systems may include a plasma screen coupled with the substrate support and configured to substantially eliminate plasma leakage through the plasmascreen. The plasma screen may be coupled with electrical ground. 系统和方法可用于制定等离子体过滤。示例性处理腔室可包括喷淋头。处理腔室可包括基板支撑件。处理腔室可包括电源，所述电源与基板支撑件电气耦合并且经构造以向基板支撑件提供电力，来在喷淋头与基板支撑件之间限定的处理区域内产生偏压等离子体。处理系统可包括等离子体屏蔽件，所述等离子体屏蔽件与基板支撑件耦合并且经构造以实质上消除穿过等离子体屏蔽件的等离子体泄漏。等离子体屏蔽件可与电气接地耦合。