MEMBRANE ASSEMBLY AND PARTICLE TRAP
Particle trap assemblies configured to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. The particle trap may be a gap geometric particle trap located between a stationary part and...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
02.04.2019
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Subjects | |
Online Access | Get full text |
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Summary: | Particle trap assemblies configured to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. The particle trap may be a gap geometric particle trap located between a stationary part and a movable part of the lithography apparatus. The particle trap may also be a surface geometric particle trap located on a surface of a particle sensitive environment in lithography or metrology apparatus.
颗粒捕集器组件配置成减少具有较大范围的尺寸、材料、行进速度和入射角的污染物颗粒到达颗粒敏感环境的可能性。所述颗粒捕集器可以是位于光刻设备的静止零件与可移动零件之间的间隙几何颗粒捕集器。所述颗粒捕集器也可以是位于光刻或量测设备中的颗粒敏感环境的表面上的表面几何颗粒捕集器。 |
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Bibliography: | Application Number: CN201780046859 |