PROCESS FOR DEPOSITING A METAL OR METAL ALLOY ON A SURFACE OF A SUBSTRATE INCLUDING ITS ACTIVATION

• Main Authors: NGUYEN TANG CAM LAI, WENDELN CHRISTIAN, DOSSE BEXY, KRILLES GERSON, WURDINGER KAY, STAMP LUTZ
• Format: Patent
• Language: Chinese; English
• Published: 21.12.2018
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The present invention relates to a process for depositing a metal or metal alloy on at least one surface of a substrate comprising the steps of (a) providing said substrate; (b) treating the surface of said substrate with an activation solution comprising at least one source of metal ions selected from the group consisting of ruthenium, rhodium, palladium, osmium, iridium, platinum, copper, silver, nickel, cobalt, gold and mixtures thereof such that at least one portion of said metal ions is being adsorbed on the surface of said substrate; (c) treating the surface of said substrate obtained from step (b) with a treatment solution comprising i) at least one additive independently selected from the group consisting of thiols, thioethers, disulphides and sulphur containing heterocycles, and ii) at least one reducing agent suitable to reduce the metal ions adsorbed on the surface of said substrate selected from the group consisting of boron based reducing agents, sources of hypophosphite ions, hydrazine and hydra