Texture regulation and control method and device of external energy field module to high throughput thin film

• Main Authors: GAO KEWEI, YANG HUISHENG, YANG YANG, XU QIUFA, LI DONGDONG, PANG XIAOLU, TONG HAISHENG
• Format: Patent
• Language: Chinese; English
• Published: 30.03.2018
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention relates to a high throughput preparation method for thin film ingredients and textures by adding an energy field module to complete high throughput thin film ingredient and microscopic structure regulation and control in the thin film sedimentation process, and in particular to a texture regulation and control method and device of the external energy field module to high throughput thin films. High throughput screening of the high throughput thin film ingredients and textures is achieved. Test instruments include a mask control system, an external energy field controller, an XRDanalysis meter and a field emission scanning electron microscope. A double-target magnetic control co-sputtering method is adopted for preparing thin film samples with the ingredients and textures changed in a gradient manner, the thin films at different positions on a base surface are subject to sedimentation at different times through mask motion and external energy field changes, the thin filmssubject to sedimentation