Diphenyl ether compound as well as preparation method and application thereof

The invention discloses a diphenyl ether compound as well as a preparation method and application thereof. The diphenyl ether compound is prepared from a phomopsis fukushii strain through fermentation, extraction, chromatography and purification, with a molecular formula C18H20O5 and a structural fo...

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Bibliographic Details
Main Authors DU GANG, HU QIUYUE, YANG HAIYING, HU QIUFEN, LIU YUN, ZHAN MENGTAO, LU XIAOKAI
Format Patent
LanguageChinese
English
Published 20.03.2018
Subjects
ACYCLIC OR CARBOCYCLIC COMPOUNDS
BEER
BIOCHEMISTRY
CHEMISTRY
ENZYMOLOGY
FERMENTATION OR ENZYME-USING PROCESSES TO SYNTHESISE A DESIREDCHEMICAL COMPOUND OR COMPOSITION OR TO SEPARATE OPTICAL ISOMERSFROM A RACEMIC MIXTURE
HUMAN NECESSITIES
HYGIENE
MEDICAL OR VETERINARY SCIENCE
METALLURGY
MICROBIOLOGY
MUTATION OR GENETIC ENGINEERING
ORGANIC CHEMISTRY
PROCESSES USING MICROORGANISMS
SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS ORMEDICINAL PREPARATIONS
SPIRITS
VINEGAR
WINE
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Summary:The invention discloses a diphenyl ether compound as well as a preparation method and application thereof. The diphenyl ether compound is prepared from a phomopsis fukushii strain through fermentation, extraction, chromatography and purification, with a molecular formula C18H20O5 and a structural formula shown in the specification; the compound is named as diphenther B; the collection number of the phomopsis fukushii strain is CCTCC M 2017632, and the collection date is October 23, 2017. The preparation method adopts the fermented solid of the phomopsis fukushii strain as a raw material and comprises the steps of extraction with an organic solvent, silica-gel column chromatography and high pressure liquid chromatography separation. The application refers to application of the diphenyl ether compound in preparing a methicillin-resistant staphylococcus aureus resistant medicine. The compound disclosed by the invention has the advantages of novel structure, high activity and relatively good application prospect.
Bibliography:Application Number: CN201711067113