Target for ultraviolet light generation, electron beam-excited ultraviolet light source, and production method for the target for ultraviolet light generation

A target for ultraviolet light generation is provided with a substrate allowing ultraviolet light to pass through and a light-emitting layer provided on the substrate, receiving an electron beam and generating ultraviolet light. The light-emitting layer includes: a polycrystalline film comprising an...

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Main Authors KAWAI KOJI, TAKAOKA HIDETSUGU, FUKUYO FUMITSUGU, ICHIKAWA NORIO, TAKETOMI HIROYUKI, SUZUKI TAKASHI, HONDA YOSHINORI
Format Patent
LanguageEnglish
Published 01.07.2015
Subjects
ADHESIVES
BASIC ELECTRIC ELEMENTS
CHEMISTRY
DYES
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
POLISHES
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Summary:A target for ultraviolet light generation is provided with a substrate allowing ultraviolet light to pass through and a light-emitting layer provided on the substrate, receiving an electron beam and generating ultraviolet light. The light-emitting layer includes: a polycrystalline film comprising an oxide polycrystal that contains Lu and Si to which an activator has been added; or a polycrystalline film comprising a rare earth-containing aluminum garnet polycrystal to which an activator has been added.
Bibliography:Application Number: CN201380055517