Process for making glass sheet with low compaction suitable for high temperature applications
A process for making glass sheet with low compaction suitable for high temperature applications, such as low-temperature polysilicon-based TFT displays, and glass sheets thus made. The glass sheet desirably has an anneal point of at least 765 DEG C, a CTE at most 42x10 -7 / DEG C. The process involv...
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| Main Authors | , , |
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| Format | Patent |
| Language | Chinese English |
| Published |
17.04.2013
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| Subjects | |
| Online Access | Get full text |
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| Abstract | A process for making glass sheet with low compaction suitable for high temperature applications, such as low-temperature polysilicon-based TFT displays, and glass sheets thus made. The glass sheet desirably has an anneal point of at least 765 DEG C, a CTE at most 42x10 -7 / DEG C. The process involves cooling the glass melt form a temperature corresponding to a viscosity of 1.0x10 10 poise to a temperature corresponding to a viscosity of 1.0x10 15 poise at a cooling rate CR, where CR 5 DEG G/second. The absolute value of the measured compaction of the glass sheet desirably is at most 175 ppm upon being re-heated to 675 DEG C for a period of time. |
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| AbstractList | A process for making glass sheet with low compaction suitable for high temperature applications, such as low-temperature polysilicon-based TFT displays, and glass sheets thus made. The glass sheet desirably has an anneal point of at least 765 DEG C, a CTE at most 42x10 -7 / DEG C. The process involves cooling the glass melt form a temperature corresponding to a viscosity of 1.0x10 10 poise to a temperature corresponding to a viscosity of 1.0x10 15 poise at a cooling rate CR, where CR 5 DEG G/second. The absolute value of the measured compaction of the glass sheet desirably is at most 175 ppm upon being re-heated to 675 DEG C for a period of time. |
| Author | KICZENSKI TIMOTHY J DANIELSON PAUL STEPHEN ELLISON ADAM JAMES |
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| Notes | Application Number: CN20121568726 |
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| Snippet | A process for making glass sheet with low compaction suitable for high temperature applications, such as low-temperature polysilicon-based TFT displays, and... |
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| SubjectTerms | BASIC ELECTRIC ELEMENTS CHEMISTRY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GLASS MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES METALLURGY MINERAL OR SLAG WOOL SEMICONDUCTOR DEVICES |
| Title | Process for making glass sheet with low compaction suitable for high temperature applications |
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