Process for making glass sheet with low compaction suitable for high temperature applications

A process for making glass sheet with low compaction suitable for high temperature applications, such as low-temperature polysilicon-based TFT displays, and glass sheets thus made. The glass sheet desirably has an anneal point of at least 765 DEG C, a CTE at most 42x10 -7 / DEG C. The process involv...

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Bibliographic Details
Main Authors DANIELSON PAUL STEPHEN, KICZENSKI TIMOTHY J, ELLISON ADAM JAMES
Format Patent
LanguageChinese
English
Published 17.04.2013
Subjects
BASIC ELECTRIC ELEMENTS
CHEMISTRY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GLASS
MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
METALLURGY
MINERAL OR SLAG WOOL
SEMICONDUCTOR DEVICES
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Summary:A process for making glass sheet with low compaction suitable for high temperature applications, such as low-temperature polysilicon-based TFT displays, and glass sheets thus made. The glass sheet desirably has an anneal point of at least 765 DEG C, a CTE at most 42x10 -7 / DEG C. The process involves cooling the glass melt form a temperature corresponding to a viscosity of 1.0x10 10 poise to a temperature corresponding to a viscosity of 1.0x10 15 poise at a cooling rate CR, where CR 5 DEG G/second. The absolute value of the measured compaction of the glass sheet desirably is at most 175 ppm upon being re-heated to 675 DEG C for a period of time.
Bibliography:Application Number: CN20121568726