Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition

The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for...

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Bibliographic Details
Main Author MASCHWITZ PETER
Format Patent
LanguageChinese
English
Published 31.08.2011
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