Method for manufacturing patterning substrate by nano-microspheres

• Main Authors: CHEN QICHANG, HOU JIAHONG, ZHAN JIAHUA, CHEN QINGREN
• Format: Patent
• Language: Chinese; English
• Published: 18.05.2011
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGYGENERATION, TRANSMISSION OR DISTRIBUTION; SEMICONDUCTOR DEVICES; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE

The invention relates to a method for manufacturing a patterning substrate by nano-microspheres, which comprises the following steps of: (A) providing a substrate, wherein a light resistance layer is arranged on the surface of the substrate; (B) coating a plurality of nano-microspheres on the surface of the light resistance layer to form a nano-microsphere layer; (C) performing an exposure and developing process to pattern the light resistance layer; (D) removing the nano-microsphere layer; (E1) after removing the nano-microsphere layer, etching the substrate by taking the patterned light resistance layer as an etching shield; and (E2) removing the light resistance layer to obtain the patterning substrate, wherein a plurality of grooves are formed on the patterning substrate.