Method for suppressing plasma unstable

The method comprises: adding the electropositive plasma gas into the raw material gas which contains the electronegative plasma gas and is provided for the plasma generator to make the electronic density of the plasma generated in the plasma generator increased; wherein, the addition of electroposit...

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Bibliographic Details
Main Author HANMING,GAO WU
Format Patent
LanguageEnglish
Published 10.10.2007
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
SEMICONDUCTOR DEVICES
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Abstract The method comprises: adding the electropositive plasma gas into the raw material gas which contains the electronegative plasma gas and is provided for the plasma generator to make the electronic density of the plasma generated in the plasma generator increased; wherein, the addition of electropositive plasma gas makes the generated plasma stable.
AbstractList The method comprises: adding the electropositive plasma gas into the raw material gas which contains the electronegative plasma gas and is provided for the plasma generator to make the electronic density of the plasma generated in the plasma generator increased; wherein, the addition of electropositive plasma gas makes the generated plasma stable.
Author HANMING,GAO WU
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Snippet The method comprises: adding the electropositive plasma gas into the raw material gas which contains the electronegative plasma gas and is provided for the...
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SubjectTerms BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
SEMICONDUCTOR DEVICES
Title Method for suppressing plasma unstable
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