A CMOS imager photodiode with enhanced capacitance and method for manufacturing same
A pixel sensor cell having a semiconductor substrate having a surface; a photosensitive element formed in a substrate having a non-laterally disposed charge collection region entirely isolated from a physical boundary including the substrate surface. The photosensitive element comprises a trench hav...
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Main Author | |
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Format | Patent |
Language | English |
Published |
22.08.2007
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Subjects | |
Online Access | Get full text |
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