Dielectric film forming method
A method of forming a dielectric film on a substrate surface includes the steps of forming the dielectric film on the substrate surface in plural steps, and reforming, in each of the plural steps of forming the dielectric film, the dielectric film in an ambient primarily of nitrogen.
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
13.08.2008
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Subjects | |
Online Access | Get full text |
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Summary: | A method of forming a dielectric film on a substrate surface includes the steps of forming the dielectric film on the substrate surface in plural steps, and reforming, in each of the plural steps of forming the dielectric film, the dielectric film in an ambient primarily of nitrogen. |
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Bibliography: | Application Number: CN20038025630 |