Method, system, and medium for handling misrepresentative metrology data within an advanced process control system

• Main Authors: ENTIN EFIM, SEROR JACQUES, KOKOTOV YURI
• Format: Patent
• Language: Chinese; English
• Published: 28.11.2007
• Subjects: BASIC ELECTRIC ELEMENTS; CALCULATING; COMPUTING; CONTROL OR REGULATING SYSTEMS IN GENERAL; CONTROLLING; COUNTING; ELECTRIC DIGITAL DATA PROCESSING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS; PHYSICS; REGULATING; SEMICONDUCTOR DEVICES

A system, method and medium of controlling a semiconductor manufacturing tool using a feedback control mechanism. The feedback control mechanism includes features for receiving data points relating to an output of the tool. The data points include a current data point and at least one previous data...