OPTICAL ARRANGEMENT AND ITS USE

The invention relates to an optical arrangement (10) having a laser (1), wherein an amplitude mask (3) is introduced in the beam path of the laser beam (2) coming from the laser (1), between the laser (1) and a focusing element (4), such that the laser beam (2) can be guided such that the laser beam...

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Main Authors LEDERMANN, ALEXANDRA, WEGENER, MARTIN, VON FREYMANN, GEORG
Format Patent
LanguageEnglish
French
Published 07.04.2015
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Abstract The invention relates to an optical arrangement (10) having a laser (1), wherein an amplitude mask (3) is introduced in the beam path of the laser beam (2) coming from the laser (1), between the laser (1) and a focusing element (4), such that the laser beam (2) can be guided such that the laser beam (2) strikes the amplitude mask (3) before the laser beam is focused in the focusing element (4) and the laser beam (2'), which has been modified by the focusing element (4), is directed at a focal point (6) and, if appropriate, at least two sub-maxima (7, 7') in a photosensitive material (5). The arrangement (10) is thus suitable for producing chemical or physical changes, ablations, micro-explosions, plasmas or micro-tears in the photosensitive material (5). The arrangement (10) is preferably used for carrying out single-photon or multi-photon absorption in the focal point (6) or in one of the at least two sub-maxima (7, 7') of the modified laser beam (2') in the photosensitive material (5).
AbstractList The invention relates to an optical arrangement (10) having a laser (1), wherein an amplitude mask (3) is introduced in the beam path of the laser beam (2) coming from the laser (1), between the laser (1) and a focusing element (4), such that the laser beam (2) can be guided such that the laser beam (2) strikes the amplitude mask (3) before the laser beam is focused in the focusing element (4) and the laser beam (2'), which has been modified by the focusing element (4), is directed at a focal point (6) and, if appropriate, at least two sub-maxima (7, 7') in a photosensitive material (5). The arrangement (10) is thus suitable for producing chemical or physical changes, ablations, micro-explosions, plasmas or micro-tears in the photosensitive material (5). The arrangement (10) is preferably used for carrying out single-photon or multi-photon absorption in the focal point (6) or in one of the at least two sub-maxima (7, 7') of the modified laser beam (2') in the photosensitive material (5).
Author LEDERMANN, ALEXANDRA
VON FREYMANN, GEORG
WEGENER, MARTIN
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DocumentTitleAlternate ARRANGEMENT OPTIQUE ET UTILISATION DE CELUI-CI
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Snippet The invention relates to an optical arrangement (10) having a laser (1), wherein an amplitude mask (3) is introduced in the beam path of the laser beam (2)...
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SubjectTerms CLADDING OR PLATING BY SOLDERING OR WELDING
CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING
MACHINE TOOLS
METAL-WORKING NOT OTHERWISE PROVIDED FOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PERFORMING OPERATIONS
PHYSICS
SOLDERING OR UNSOLDERING
TRANSPORTING
WELDING
WORKING BY LASER BEAM
Title OPTICAL ARRANGEMENT AND ITS USE
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