LASER BEAM IRRADIATION APPARATUS WITH HIGH ACCURACY AND STABILITY
An excimer laser beam irradiation apparatus capable of processing a workpiece optimally with an excimer irradiation beam even when intensity distribution of the excimer laser beam undergone multiple reflections is non-uniform. A patterning mask has light-transmissive portions for allowing the excime...
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Main Authors | , , , , , |
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Format | Patent |
Language | English French |
Published |
26.01.1999
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Edition | 6 |
Subjects | |
Online Access | Get full text |
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