LASER BEAM IRRADIATION APPARATUS WITH HIGH ACCURACY AND STABILITY

An excimer laser beam irradiation apparatus capable of processing a workpiece optimally with an excimer irradiation beam even when intensity distribution of the excimer laser beam undergone multiple reflections is non-uniform. A patterning mask has light-transmissive portions for allowing the excime...

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Bibliographic Details
Main Authors SUGITATSU, ATSUSHI, NAKATANI, HAJIME, MINAGAWA, TADAO, ITO, KEIKO, MURAKAMI, KAZUYUKI, YAGI, TOSHINORI
Format Patent
LanguageEnglish
French
Published 26.01.1999
Edition6
Subjects
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