EVALUATING METHOD AND METHOD FOR MANUFACTURING EXPOSURE APPARATUS

• Main Authors: TSUNEHITO HAYASHI, KANAME TAKEDA
• Format: Patent
• Language: English
• Published: 10.06.2003
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A pattern formation member where a predetermined pattern is formed is placed on a first surface, a photosensitive body having a physical property concerning color such as the color density variable with the amount of energy of an energy beam applied is placed on a second surface, and the pattern is...