VERFAHREN ZUR HERSTELLUNG POLYHEDRISCHER OLIGOMERER SILSESQUIOXANE

• Main Authors: TERROBA, RACHEL, QIBO, LIU, SCHWAB, JOSEPH, J, LICHTENHAN, JOSEPH, D, CARR, MICHAEL, J, FEHER, FRANK, J, AN, YI-ZHONG, REINERTH, WILLIAM
• Format: Patent
• Language: German
• Published: 15.10.2006
• Edition: 7
• Subjects: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; CHEMISTRY; COMPOSITIONS BASED THEREON; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; METALLURGY; ORGANIC CHEMISTRY; ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP

Three processes for the manufacture of polyhedral oligomeric silsesquioxanes (POSS) which utilize the action of bases that are capable of either attacking silicon or any compound that can react with a protic solvent (e.g. ROH, H2O etc.) and generate hydroxide [OH]<->; alkoxide [RO]<->, e...