VERFAHREN UND VORRICHTUNG ZUM HERSTELLEN EINES GASGEMISCHES ENTHALTEND EIN TRÄGERGAS, EINE OXIDIERENDES GAS UND EIN SILAN

• Main Authors: VILLERMET, ALAIN, COCOLIOS, PANAYOTIS, INIZAN, MICHEL, COEURET, FRANCOIS
• Format: Patent
• Language: German
• Published: 15.07.2001
• Edition: 7
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COMPOUNDS THEREOF; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; INORGANIC CHEMISTRY; METALLURGY; NON-METALLIC ELEMENTS; PERFORMING OPERATIONS; SPRAYING OR ATOMISING IN GENERAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

The process forms a gaseous mixture of predetermined composition, containing a carrier gas, oxidant and silane. A primary gas mixture is formed from a second neutral gas and the silane. The silane content is below the spontaneous flammability limit of silane in air. A first gas stream is prepared, comprising carrier gas with controlled oxidant gas residual. The required mixture is achieved as a function of the residual oxidant content in the carrier gas stream. Also claimed are: (i) the plant for the above process; and (ii) gaseous mixtures formed by the above process.