APA (7th ed.) Citation

Veloso, A., Paraschiv, V., Vecchio, E., Devriendt, K., Li, W., Simoen, E., . . . Collaert, N. (2017). (Invited) Challenges on Surface Conditioning in 3D Device Architectures: Triple-Gate FinFETs, Gate-All-Around Lateral and Vertical Nanowire FETs. Meeting abstracts (Electrochemical Society), MA2017-02(24), 1055. https://doi.org/10.1149/MA2017-02/24/1055

Chicago Style (17th ed.) Citation

Veloso, Anabela, et al. "(Invited) Challenges on Surface Conditioning in 3D Device Architectures: Triple-Gate FinFETs, Gate-All-Around Lateral and Vertical Nanowire FETs." Meeting Abstracts (Electrochemical Society) MA2017-02, no. 24 (2017): 1055. https://doi.org/10.1149/MA2017-02/24/1055.

MLA (9th ed.) Citation

Veloso, Anabela, et al. "(Invited) Challenges on Surface Conditioning in 3D Device Architectures: Triple-Gate FinFETs, Gate-All-Around Lateral and Vertical Nanowire FETs." Meeting Abstracts (Electrochemical Society), vol. MA2017-02, no. 24, 2017, p. 1055, https://doi.org/10.1149/MA2017-02/24/1055.