A Novel Light Scattering Analysis Method for Monitoring Undiluted CMP Slurry

• Published in: Meeting abstracts (Electrochemical Society) Vol. MA2016-01; no. 17; p. 1037
• Main Authors: Fury, Michael A., Klein, Michael F., Burlison, Phil, Wakefield, Ray
• Format: Journal Article
• Language: English
• Published: 01.04.2016

Correlation of CMP slurry properties including large particle counts (LPC) to semiconductor manufacturing defect and yield metrics has long been a promise of proper implementation of undiluted slurry process monitoring [1]. Continuous, real-time metrology validating this correlation has now been in...