Gas permeable mold for defect reduction in nanoimprint lithography

• Main Authors: Mizui, Kento, Hanabata, Makoto, Takei, Satoshi
• Format: Conference Proceeding
• Language: English
• Published: SPIE 26.03.2019

In recent years, nanoimprint lithography is applied to manufacturing of optical materials and biosensor. However, void and generated gas are caused pattern failures. We proposed cellulose based gas permeable molds to reduce pattern failures. In this research we could raise the mold reproducibility b...