Gas permeable mold for defect reduction in nanoimprint lithography

In recent years, nanoimprint lithography is applied to manufacturing of optical materials and biosensor. However, void and generated gas are caused pattern failures. We proposed cellulose based gas permeable molds to reduce pattern failures. In this research we could raise the mold reproducibility b...

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Main Authors Mizui, Kento, Hanabata, Makoto, Takei, Satoshi
Format Conference Proceeding
LanguageEnglish
Published SPIE 26.03.2019
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Abstract In recent years, nanoimprint lithography is applied to manufacturing of optical materials and biosensor. However, void and generated gas are caused pattern failures. We proposed cellulose based gas permeable molds to reduce pattern failures. In this research we could raise the mold reproducibility by using the under-layer coating and liquid release agent. It was confirmed that imprinting materials including 10 wt% each of acetone, cyclopentane, and propylene glycol methyl ether acetate (PGMEA) as volatile solvents could also be imprinted accuracy and number of imprinting times were increased. In addition, we succeeded in expand the cellulose based gas permeable mold size 5 times as compared with the conventional cellulose based gas permeable mold by using step and repeat process and large scale quartz mold. Various manufacturing can be expected by increasing the repeatability and the pattern area of the cellulose based gas permeable mold.
AbstractList In recent years, nanoimprint lithography is applied to manufacturing of optical materials and biosensor. However, void and generated gas are caused pattern failures. We proposed cellulose based gas permeable molds to reduce pattern failures. In this research we could raise the mold reproducibility by using the under-layer coating and liquid release agent. It was confirmed that imprinting materials including 10 wt% each of acetone, cyclopentane, and propylene glycol methyl ether acetate (PGMEA) as volatile solvents could also be imprinted accuracy and number of imprinting times were increased. In addition, we succeeded in expand the cellulose based gas permeable mold size 5 times as compared with the conventional cellulose based gas permeable mold by using step and repeat process and large scale quartz mold. Various manufacturing can be expected by increasing the repeatability and the pattern area of the cellulose based gas permeable mold.
Author Hanabata, Makoto
Takei, Satoshi
Mizui, Kento
Author_xml – sequence: 1
  givenname: Kento
  surname: Mizui
  fullname: Mizui, Kento
  organization: Toyama Prefectural Univ. (Japan)
– sequence: 2
  givenname: Makoto
  surname: Hanabata
  fullname: Hanabata, Makoto
  organization: Toyama Prefectural Univ. (Japan)
– sequence: 3
  givenname: Satoshi
  surname: Takei
  fullname: Takei, Satoshi
  organization: Toyama Prefectural Univ. (Japan)
BookMark eNp1kM1KAzEYRQNWsK3d-ARZC61J5ifJsra2FgoWqiBuQib50kamyZAZEX16q3bjwtWFc-FwuQPUCzEAQleUTCil_IayCStoziU5QyPJBS0oKVlRZrSH-oRxPuaifL5Ag7Z9JYSJgss-ul3qFjeQDqCrGvAh1ha7mLAFB6bDCeyb6XwM2AccdIj-0CQfOlz7bh93STf7j0t07nTdwuiUQ_S0uHuc3Y_XD8vVbLoet4xn3ThnruQsA0lIBkxbI4gsJc3B5EwDr46kEpYXkjFDqpxIXlowVQaZk8JWOhuil19v23hQTYoGwPqwa9Vmu9rOl5TIQiiXYujU-3Ge8zW06tM3f_pp6rypYTNfqB9AhWqsO8qv_5FTor7vVZSp073ZF_gmbro
ContentType Conference Proceeding
Copyright COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only.
Copyright_xml – notice: COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only.
DOI 10.1117/12.2514790
DatabaseTitleList
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
Editor Sanchez, Martha I
Panning, Eric M
Editor_xml – sequence: 1
  givenname: Martha I
  surname: Sanchez
  fullname: Sanchez, Martha I
  organization: IBM Research - Almaden (United States)
– sequence: 2
  givenname: Eric M
  surname: Panning
  fullname: Panning, Eric M
  organization: Intel Corp. (United States)
EndPage 1095818-6
ExternalDocumentID 10_1117_12_2514790
GroupedDBID 29O
5SJ
ACGFS
ALMA_UNASSIGNED_HOLDINGS
EBS
EJD
F5P
FQ0
R.2
RNS
RSJ
SPBNH
UT2
ID FETCH-LOGICAL-s273t-42f6723e9003e2adc8096914ec42ae7badcb8d75922c0b40976decb3e3f98dba3
ISBN 9781510625631
1510625631
ISSN 0277-786X
IngestDate Tue Nov 10 16:04:55 EST 2020
Tue Jan 05 21:43:47 EST 2021
IsPeerReviewed false
IsScholarly true
Language English
LinkModel OpenURL
MergedId FETCHMERGED-LOGICAL-s273t-42f6723e9003e2adc8096914ec42ae7badcb8d75922c0b40976decb3e3f98dba3
Notes Conference Date: 2019-02-24|2019-02-28
Conference Location: San Jose, California, United States
ParticipantIDs spie_proceedings_10_1117_12_2514790
ProviderPackageCode SPBNH
UT2
FQ0
R.2
PublicationCentury 2000
PublicationDate 20190326
PublicationDateYYYYMMDD 2019-03-26
PublicationDate_xml – month: 3
  year: 2019
  text: 20190326
  day: 26
PublicationDecade 2010
PublicationYear 2019
Publisher SPIE
Publisher_xml – name: SPIE
SSID ssj0028579
ssib036084260
Score 2.0600517
Snippet In recent years, nanoimprint lithography is applied to manufacturing of optical materials and biosensor. However, void and generated gas are caused pattern...
SourceID spie
SourceType Enrichment Source
Publisher
StartPage 1095818
Title Gas permeable mold for defect reduction in nanoimprint lithography
URI http://www.dx.doi.org/10.1117/12.2514790
Volume 10958
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV1Lb5wwELaa7aU99ZGq6SOylF5JCQbbHNNuXlVTrbQbKTdkY6OgdGEVyGV_fWeMF8ijUtMLWgwCs98wnjHzfSbkSxgaJTk38CIpEaBAV4DFUEHCcMDUqVSFq_L9xU8v4h-XyeWwoqBjl7R6P18_yiv5H1ShDXBFluwTkO0vCg3wG_CFLSAM23vB76PjzIlqUHZ4aR39aVn_Nq5o0FgnSHyDoqybUsZKVXW5xEm8FlnHV2OhascIXN-WnqbT1oNXqpRWXXh5rq7r4chCXduym1Bu6-aqHM8dIF2JBR1B3VdcnN3NJ2H4DyEh4t4xd24IP_IK6dYbHHwmRGZy5PfcvnekdtwS8L_4acf0j_YhvIpFt2DoPd3rLjsR2UGU-ZO2yBZ0cUKeH07Pf843XoPxUKLMfp9my6RTWNz0G-l8_XN5la9-3yvWwo2-Dr3Bqr5VaUeBxuIV2R4omHTWg_6aPLPVG_JypB75lnwD_GmPP0X8KeBPO_xpjz8tKzrCn47w3yYXx0eL76eBXxIjaCDObIM4KriImMX5Zxspk0tIQdOD2OZxpKzQ0KKlEUkaRXmoUcuMG5trZlmRSqMVe0cmVV3Z94SijFEcJ5pbLC6ViU5VxITmJjaSWaF2yB7-Cdlg4E32EJMdMn9w1mx-Np-eOAPICpThyPCbAuqMNdm6XN05ftj5x9n0OPMWk61M8eGf7v2RvBiM-hOZtDe39jOEiK3e9TbyB9O_WyY
linkProvider EBSCOhost
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Abook&rft.genre=proceeding&rft.title=Gas+permeable+mold+for+defect+reduction+in+nanoimprint+lithography&rft.au=Mizui%2C+Kento&rft.au=Hanabata%2C+Makoto&rft.au=Takei%2C+Satoshi&rft.date=2019-03-26&rft.pub=SPIE&rft.isbn=9781510625631&rft.issn=0277-786X&rft.volume=10958&rft.spage=1095818&rft.epage=1095818-6&rft_id=info:doi/10.1117%2F12.2514790&rft.externalDocID=10_1117_12_2514790
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0277-786X&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0277-786X&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0277-786X&client=summon