Metrospection holistic AI-driven process control software platform dedicated to metrology and defectivity for patterning process at die and wafer levels

• Main Authors: Baderot, Julien, Hallal, Ali, Jacob, Martin, Martinez, Sergio, Foucher, Johann
• Format: Conference Proceeding
• Language: English
• Published: SPIE 18.09.2024

Lithography processes are important as they impact following process steps such as etching and deposition. Additionally, to keep up with the feature size reduction race, the number of steps and process complexity are increasing drastically. To maintain performances and produce masks and wafers with...