Optical inspection of photomasks: What's next?
The subject of photomask inspection has received increasing attention over the past few years. Mask makers have come to rely on automatic optical inspection for two reasons. First, it is a necessary means to provide quality assurance to their fabline customers. The fablines will specify a maximum de...
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| Main Author | |
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| Format | Conference Proceeding |
| Language | English |
| Published |
SPIE
10.10.2023
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| Online Access | Get full text |
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| Abstract | The subject of photomask inspection has received increasing attention over the past few years. Mask makers have come to rely on automatic optical inspection for two reasons. First, it is a necessary means to provide quality assurance to their fabline customers. The fablines will specify a maximum defect dimension and a maximum defect density. These specifications can be guaranteed. Second, photomask inspection is a vital link in control of the mask making process itself. The feedback provides excellent information on raw material inputs (i.e., chrome, glass, and resist), on the lithography process, and on handling and cleanliness in the mask shop. |
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| AbstractList | The subject of photomask inspection has received increasing attention over the past few years. Mask makers have come to rely on automatic optical inspection for two reasons. First, it is a necessary means to provide quality assurance to their fabline customers. The fablines will specify a maximum defect dimension and a maximum defect density. These specifications can be guaranteed. Second, photomask inspection is a vital link in control of the mask making process itself. The feedback provides excellent information on raw material inputs (i.e., chrome, glass, and resist), on the lithography process, and on handling and cleanliness in the mask shop. |
| Author | Brooks, George W. |
| Author_xml | – sequence: 1 givenname: George W. surname: Brooks fullname: Brooks, George W. organization: KLA Instruments Corp. (United States) |
| BookMark | eNotj8tKAzEUQANWsK3d-AXZCcKM9yaTlxuR4gsK3Si6C5lMxkZrEsws_HwVuzic3YGzILOUUyDkDKFFRHWJrOWAyKE7IiujNAoEKbXUfEbmwJRqlJavJ2RR6zsA00KZOWm3ZYre7WlMtQQ_xZxoHmnZ5Sl_uvpRr-jLzk3nlabwPV2fkuPR7WtYHbwkz3e3T-uHZrO9f1zfbJqKILrG88Cl6BUaoXs9IDCjufjFOeNHcGxEwKBHbsAr2fWcuV569INggxx6x5fk4r9bSwy2fGUfwhDTW7UI9u_WIrOHW_4D6gtGvg |
| ContentType | Conference Proceeding |
| Copyright | COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only. |
| Copyright_xml | – notice: COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only. |
| DOI | 10.1117/12.3011304 |
| DatabaseTitleList | |
| DeliveryMethod | fulltext_linktorsrc |
| Discipline | Engineering |
| EndPage | 1280607-6 |
| ExternalDocumentID | 10_1117_12_3011304 |
| GroupedDBID | 29O 4.4 5SJ ACGFS ALMA_UNASSIGNED_HOLDINGS EBS F5P FQ0 R.2 RNS RSJ SPBNH UT2 |
| ID | FETCH-LOGICAL-s1054-c3e365b71958b8d1029835983aa9cf0a2f101e8f390c764b32ab6c1cd52d6dba3 |
| ISBN | 9781510668683 1510668683 |
| ISSN | 0277-786X |
| IngestDate | Sat Oct 14 04:10:31 EDT 2023 |
| IsPeerReviewed | false |
| IsScholarly | true |
| Language | English |
| LinkModel | OpenURL |
| MergedId | FETCHMERGED-LOGICAL-s1054-c3e365b71958b8d1029835983aa9cf0a2f101e8f390c764b32ab6c1cd52d6dba3 |
| Notes | Conference Location: Santa Clara, CA, United States Conference Date: 1982-06-08|1982-06-09 |
| ParticipantIDs | spie_proceedings_10_1117_12_3011304 |
| PublicationCentury | 2000 |
| PublicationDate | 20231010 |
| PublicationDateYYYYMMDD | 2023-10-10 |
| PublicationDate_xml | – month: 10 year: 2023 text: 20231010 day: 10 |
| PublicationDecade | 2020 |
| PublicationYear | 2023 |
| Publisher | SPIE |
| Publisher_xml | – name: SPIE |
| SSID | ssj0028579 |
| Score | 2.2349966 |
| Snippet | The subject of photomask inspection has received increasing attention over the past few years. Mask makers have come to rely on automatic optical inspection... |
| SourceID | spie |
| SourceType | Publisher |
| StartPage | 1280607 |
| Title | Optical inspection of photomasks: What's next? |
| URI | http://www.dx.doi.org/10.1117/12.3011304 |
| Volume | 12806 |
| hasFullText | 1 |
| inHoldings | 1 |
| isFullTextHit | |
| isPrint | |
| link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV1LS8NAEF5svejJR8U3AQUPkpjsbh71IuKDKlYFW-ytZJMNlkJSbLz4653JrkmsFdRLSJbN5vGF2W82M98QcoguQhJT3wQ2wk0eh64JLD80qeSREAHMWEWtw-691-nz24E7qNQsiuySXFjR-9y8kv-gCm2AK2bJ_gHZclBogH3AF7aAMGxnyO_ceeZhohaiR6nKl1TUb_KS5Rj0My6C3VCau1iTTzHCg5VxvOB-Z-Paqvjxs1VfAKBFKJkOBVVhEzdfnUKYw4FHBJ4qEKNtCf6p9YOiaGBl-PCvas14FceqBq2eC3WL6f1gbIt0fWqhkWCqivCMeLVyMfyhQ4e6U4M04BabZPH8snv3VPrGgatkET_vE3PwyufQ0lzlsZaZhYFPqqtjKN5kJGvsoLdCWlXepPFYIrVKFmS6RpZrko_rxNKgGRVoRpYYFWinBkJ2NDUQsLMW6V9f9S46pq5ZYU6BqXIzYpJ5rvBRw0cEsYMK9yiSyMKwHSV2SBOwgTJIWNuOfI8LRkPhRU4UuxRLe4VsgzTTLJWbxLAZlQnlkQMncRgWeEQMHXniSOnbsr1FDvCBh9UXOB1-f9_bv-q1Q5aqT2uXNPPXN7kHbCsX-xqpD9szHBY |
| linkProvider | EBSCOhost |
| openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Abook&rft.genre=proceeding&rft.title=Optical+inspection+of+photomasks%3A+What%27s+next%3F&rft.au=Brooks%2C+George+W.&rft.date=2023-10-10&rft.pub=SPIE&rft.isbn=9781510668683&rft.issn=0277-786X&rft.volume=12806&rft.spage=1280607&rft.epage=1280607-6&rft_id=info:doi/10.1117%2F12.3011304&rft.externalDocID=10_1117_12_3011304 |
| thumbnail_l | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0277-786X&client=summon |
| thumbnail_m | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0277-786X&client=summon |
| thumbnail_s | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0277-786X&client=summon |