Effects of Substrate Temperature, Deposition Pressure and Thickness on the Morphology of Ultrathin Platinum Film on SiO sub 2 /Si Substrate

• Published in: Thin solid films Vol. 219; no. 1-2; pp. 257 - 265
• Main Authors: Esfahani, R N, Maclay, G J, Zajac, G W
• Format: Journal Article
• Language: English
• Published: 30.10.1992

The dependence on thickness of the resistance of platinum film deposited by electron-beam evaporation at room temperature onto a thermally grown SiO sub 2 substrate, shows that the Pt film is in a discontinuous island form when the thickness is < 1.3 nm. At approx 2 nm the film is very continuous...