Salt‐Induced High‐Density Vacancy‐Rich 2D MoS2 for Efficient Hydrogen Evolution
Emerging non‐noble metal 2D catalysts, such as molybdenum disulfide (MoS2), hold great promise in hydrogen evolution reactions. The sulfur vacancy is recognized as a key defect type that can activate the inert basal plane to improve the catalytic performance. Unfortunately, the method of introducing...
Saved in:
Published in | Advanced materials (Weinheim) Vol. 36; no. 17; pp. e2304808 - n/a |
---|---|
Main Authors | , , , , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Weinheim
Wiley Subscription Services, Inc
01.04.2024
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Abstract | Emerging non‐noble metal 2D catalysts, such as molybdenum disulfide (MoS2), hold great promise in hydrogen evolution reactions. The sulfur vacancy is recognized as a key defect type that can activate the inert basal plane to improve the catalytic performance. Unfortunately, the method of introducing sulfur vacancies is limited and requires costly post‐treatment processes. Here, a novel salt‐assisted chemical vapor deposition (CVD) method is demonstrated for synthesizing ultrahigh‐density vacancy‐rich 2H‐MoS2, with a controllable sulfur vacancy density of up to 3.35 × 1014 cm−2. This approach involves a pre‐sprayed potassium chloridepromoter on the growth substrate. The generation of such defects is closely related to ion adsorption in the growth process, the unstable MoS2‐K‐H2O triggers the formation of sulfur vacancies during the subsequent transfer process, and it is more controllable and nondestructive when compared to traditional post‐treatment methods. The vacancy‐rich monolayer MoS2 exhibits exceptional catalytic activity based on the microcell measurements, with an overpotential of ≈158.8 mV (100 mA cm−2) and a Tafel slope of 54.3 mV dec−1 in 0.5 m H2SO4 electrolyte. These results indicate a promising opportunity for modulating sulfur vacancy defects in MoS2 using salt‐assisted CVD growth. This approach represents a significant leap toward achieving better control over the catalytic performances of 2D materials.
Sulfur vacancy engineering is a vital strategy to activate the hydrogen evolution activity of the MoS2 basal plane. Unlike traditional costly post‐treatment methods, this work demonstrates a novel salt‐assisted chemical vapor deposition method for synthesizing vacancy‐rich 2H‐MoS2 electrocatalysts with exceptional catalytic activity. The generation of such defects is closely related to ion adsorption in the growth process. |
---|---|
AbstractList | Emerging non‐noble metal 2D catalysts, such as molybdenum disulfide (MoS2), hold great promise in hydrogen evolution reactions. The sulfur vacancy is recognized as a key defect type that can activate the inert basal plane to improve the catalytic performance. Unfortunately, the method of introducing sulfur vacancies is limited and requires costly post‐treatment processes. Here, a novel salt‐assisted chemical vapor deposition (CVD) method is demonstrated for synthesizing ultrahigh‐density vacancy‐rich 2H‐MoS2, with a controllable sulfur vacancy density of up to 3.35 × 1014 cm−2. This approach involves a pre‐sprayed potassium chloridepromoter on the growth substrate. The generation of such defects is closely related to ion adsorption in the growth process, the unstable MoS2‐K‐H2O triggers the formation of sulfur vacancies during the subsequent transfer process, and it is more controllable and nondestructive when compared to traditional post‐treatment methods. The vacancy‐rich monolayer MoS2 exhibits exceptional catalytic activity based on the microcell measurements, with an overpotential of ≈158.8 mV (100 mA cm−2) and a Tafel slope of 54.3 mV dec−1 in 0.5 m H2SO4 electrolyte. These results indicate a promising opportunity for modulating sulfur vacancy defects in MoS2 using salt‐assisted CVD growth. This approach represents a significant leap toward achieving better control over the catalytic performances of 2D materials. Emerging non-noble metal 2D catalysts, such as molybdenum disulfide (MoS2), hold great promise in hydrogen evolution reactions. The sulfur vacancy is recognized as a key defect type that can activate the inert basal plane to improve the catalytic performance. Unfortunately, the method of introducing sulfur vacancies is limited and requires costly post-treatment processes. Here, a novel salt-assisted chemical vapor deposition (CVD) method is demonstrated for synthesizing ultrahigh-density vacancy-rich 2H-MoS2, with a controllable sulfur vacancy density of up to 3.35 × 1014 cm-2. This approach involves a pre-sprayed potassium chloridepromoter on the growth substrate. The generation of such defects is closely related to ion adsorption in the growth process, the unstable MoS2-K-H2O triggers the formation of sulfur vacancies during the subsequent transfer process, and it is more controllable and nondestructive when compared to traditional post-treatment methods. The vacancy-rich monolayer MoS2 exhibits exceptional catalytic activity based on the microcell measurements, with an overpotential of ≈158.8 mV (100 mA cm-2) and a Tafel slope of 54.3 mV dec-1 in 0.5 m H2SO4 electrolyte. These results indicate a promising opportunity for modulating sulfur vacancy defects in MoS2 using salt-assisted CVD growth. This approach represents a significant leap toward achieving better control over the catalytic performances of 2D materials.Emerging non-noble metal 2D catalysts, such as molybdenum disulfide (MoS2), hold great promise in hydrogen evolution reactions. The sulfur vacancy is recognized as a key defect type that can activate the inert basal plane to improve the catalytic performance. Unfortunately, the method of introducing sulfur vacancies is limited and requires costly post-treatment processes. Here, a novel salt-assisted chemical vapor deposition (CVD) method is demonstrated for synthesizing ultrahigh-density vacancy-rich 2H-MoS2, with a controllable sulfur vacancy density of up to 3.35 × 1014 cm-2. This approach involves a pre-sprayed potassium chloridepromoter on the growth substrate. The generation of such defects is closely related to ion adsorption in the growth process, the unstable MoS2-K-H2O triggers the formation of sulfur vacancies during the subsequent transfer process, and it is more controllable and nondestructive when compared to traditional post-treatment methods. The vacancy-rich monolayer MoS2 exhibits exceptional catalytic activity based on the microcell measurements, with an overpotential of ≈158.8 mV (100 mA cm-2) and a Tafel slope of 54.3 mV dec-1 in 0.5 m H2SO4 electrolyte. These results indicate a promising opportunity for modulating sulfur vacancy defects in MoS2 using salt-assisted CVD growth. This approach represents a significant leap toward achieving better control over the catalytic performances of 2D materials. Emerging non‐noble metal 2D catalysts, such as molybdenum disulfide (MoS2), hold great promise in hydrogen evolution reactions. The sulfur vacancy is recognized as a key defect type that can activate the inert basal plane to improve the catalytic performance. Unfortunately, the method of introducing sulfur vacancies is limited and requires costly post‐treatment processes. Here, a novel salt‐assisted chemical vapor deposition (CVD) method is demonstrated for synthesizing ultrahigh‐density vacancy‐rich 2H‐MoS2, with a controllable sulfur vacancy density of up to 3.35 × 1014 cm−2. This approach involves a pre‐sprayed potassium chloridepromoter on the growth substrate. The generation of such defects is closely related to ion adsorption in the growth process, the unstable MoS2‐K‐H2O triggers the formation of sulfur vacancies during the subsequent transfer process, and it is more controllable and nondestructive when compared to traditional post‐treatment methods. The vacancy‐rich monolayer MoS2 exhibits exceptional catalytic activity based on the microcell measurements, with an overpotential of ≈158.8 mV (100 mA cm−2) and a Tafel slope of 54.3 mV dec−1 in 0.5 m H2SO4 electrolyte. These results indicate a promising opportunity for modulating sulfur vacancy defects in MoS2 using salt‐assisted CVD growth. This approach represents a significant leap toward achieving better control over the catalytic performances of 2D materials. Sulfur vacancy engineering is a vital strategy to activate the hydrogen evolution activity of the MoS2 basal plane. Unlike traditional costly post‐treatment methods, this work demonstrates a novel salt‐assisted chemical vapor deposition method for synthesizing vacancy‐rich 2H‐MoS2 electrocatalysts with exceptional catalytic activity. The generation of such defects is closely related to ion adsorption in the growth process. |
Author | Huang, Lingli Peng, Yung‐Kang Lee, Chun‐Sing Zhao, Jiong Leung, Ka Ho Guang, Zhiqiang Ly, Thuc Hue Lai, Ka Hei Man, Ping Gao, Shan Deng, Qingming Jiang, Shan Chen, Tianren Chen, Honglin |
Author_xml | – sequence: 1 givenname: Ping surname: Man fullname: Man, Ping organization: City University of Hong Kong Shenzhen Research Institute – sequence: 2 givenname: Shan surname: Jiang fullname: Jiang, Shan organization: The Hong Kong Polytechnic University Shenzhen Research Institute – sequence: 3 givenname: Ka Ho surname: Leung fullname: Leung, Ka Ho organization: City University of Hong Kong Shenzhen Research Institute – sequence: 4 givenname: Ka Hei surname: Lai fullname: Lai, Ka Hei organization: The Hong Kong Polytechnic University Shenzhen Research Institute – sequence: 5 givenname: Zhiqiang surname: Guang fullname: Guang, Zhiqiang organization: City University of Hong Kong – sequence: 6 givenname: Honglin surname: Chen fullname: Chen, Honglin organization: The Hong Kong Polytechnic University Shenzhen Research Institute – sequence: 7 givenname: Lingli surname: Huang fullname: Huang, Lingli organization: City University of Hong Kong Shenzhen Research Institute – sequence: 8 givenname: Tianren surname: Chen fullname: Chen, Tianren organization: The Hong Kong Polytechnic University Shenzhen Research Institute – sequence: 9 givenname: Shan surname: Gao fullname: Gao, Shan organization: City University of Hong Kong Shenzhen Research Institute – sequence: 10 givenname: Yung‐Kang surname: Peng fullname: Peng, Yung‐Kang organization: City University of Hong Kong – sequence: 11 givenname: Chun‐Sing surname: Lee fullname: Lee, Chun‐Sing organization: City University of Hong Kong – sequence: 12 givenname: Qingming surname: Deng fullname: Deng, Qingming email: q.deng@hytc.edu.cn organization: Huaiyin Normal University – sequence: 13 givenname: Jiong surname: Zhao fullname: Zhao, Jiong email: jiongzhao@polyu.edu.hk organization: The Hong Kong Polytechnic University Shenzhen Research Institute – sequence: 14 givenname: Thuc Hue orcidid: 0000-0001-7852-3811 surname: Ly fullname: Ly, Thuc Hue email: thuchly@cityu.edu.hk organization: City University of Hong Kong |
BookMark | eNpdkMtKAzEUhoMoWC9b1wNu3IyeXCYmy9JWKyiCt21Ic6kp06TORZmdj-Aj-Cw-ik_iFKULV4f_8PHz8-2h7ZiiQ-gIwykGIGfaLvUpAUKBCRBbaIALgnMGsthGA5C0yCVnYhft1fUCACQHPkBP97psvt8_rqJtjbPZNMyf-zh2sQ5Nlz1po6Pp-s9dMM8ZGWc36Z58ffpUZRPvgwkuNtm0s1Wau5hNXlPZNiHFA7TjdVm7w7-7jx4vJg-jaX59e3k1Gl7nK8K5yEnhTUEFt86LQlg6c1gWTGvKz70XmhqMKciZo3Z2DoJ5xsFyJ40BbZjUlu6jk9_eVZVeWlc3ahlq48pSR5faWhFRMEaBAu7R43_oIrVV7Nep3hiTUgq8puQv9RZK16lVFZa66hQGtXas1o7VxrEajm-Gm0R_AEOYdrw |
ContentType | Journal Article |
Copyright | 2023 Wiley‐VCH GmbH 2024 Wiley‐VCH GmbH 2023 Wiley‐VCH GmbH. |
Copyright_xml | – notice: 2023 Wiley‐VCH GmbH – notice: 2024 Wiley‐VCH GmbH – notice: 2023 Wiley‐VCH GmbH. |
DBID | 7SR 8BQ 8FD JG9 7X8 |
DOI | 10.1002/adma.202304808 |
DatabaseName | Engineered Materials Abstracts METADEX Technology Research Database Materials Research Database MEDLINE - Academic |
DatabaseTitle | Materials Research Database Engineered Materials Abstracts Technology Research Database METADEX MEDLINE - Academic |
DatabaseTitleList | Materials Research Database MEDLINE - Academic |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Engineering |
EISSN | 1521-4095 |
EndPage | n/a |
ExternalDocumentID | ADMA202304808 |
Genre | article |
GrantInformation_xml | – fundername: Shenzhen Science, Technology and Innovation Commission funderid: JCYJ20200109110213442 – fundername: Hong Kong Research Grant Council General Research Fund funderid: 11312022; 11300820; 15302522 – fundername: National Science Foundation of China funderid: 52222218; 52272045; 52173230; 21703076 – fundername: Environment and Conservation Fund funderid: 69/2021 34/2022 – fundername: Hong Kong Special Administrative Region, China funderid: C1009‐17EF – fundername: Natural Science Foundation of Jiangsu Province of China funderid: BK20211609 – fundername: City University of Hong Kong funderid: 9229074; 9667223; 9678303; 7005602 – fundername: Hong Kong Polytechnic University funderid: ZVGH; ZVRP – fundername: Collaborative Research Fund funderid: SKLMP/SCRF/0037 |
GroupedDBID | --- .3N .GA 05W 0R~ 10A 1L6 1OB 1OC 1ZS 23M 33P 3SF 3WU 4.4 4ZD 50Y 50Z 51W 51X 52M 52N 52O 52P 52S 52T 52U 52W 52X 53G 5GY 5VS 66C 6P2 702 7PT 8-0 8-1 8-3 8-4 8-5 8UM 930 A03 AAESR AAEVG AAHHS AAHQN AAMNL AANLZ AAONW AAXRX AAYCA AAZKR ABCQN ABCUV ABIJN ABJNI ABLJU ABPVW ACAHQ ACCFJ ACCZN ACGFS ACIWK ACPOU ACXBN ACXQS ADBBV ADEOM ADIZJ ADKYN ADMGS ADOZA ADXAS ADZMN ADZOD AEEZP AEIGN AEIMD AENEX AEQDE AEUQT AEUYR AFBPY AFFPM AFGKR AFPWT AFWVQ AFZJQ AHBTC AITYG AIURR AIWBW AJBDE AJXKR ALAGY ALMA_UNASSIGNED_HOLDINGS ALUQN ALVPJ AMBMR AMYDB ATUGU AUFTA AZBYB AZVAB BAFTC BDRZF BFHJK BHBCM BMNLL BMXJE BNHUX BROTX BRXPI BY8 CS3 D-E D-F DCZOG DPXWK DR1 DR2 DRFUL DRSTM EBS F00 F01 F04 F5P G-S G.N GNP GODZA H.T H.X HBH HGLYW HHY HHZ HZ~ IX1 J0M JPC KQQ LATKE LAW LC2 LC3 LEEKS LH4 LITHE LOXES LP6 LP7 LUTES LYRES MEWTI MK4 MRFUL MRSTM MSFUL MSSTM MXFUL MXSTM N04 N05 N9A NF~ NNB O66 O9- OIG P2P P2W P2X P4D Q.N Q11 QB0 QRW R.K RNS ROL RWI RWM RX1 RYL SUPJJ TN5 UB1 UPT V2E W8V W99 WBKPD WFSAM WIB WIH WIK WJL WOHZO WQJ WRC WXSBR WYISQ XG1 XPP XV2 YR2 ZZTAW ~02 ~IA ~WT 7SR 8BQ 8FD AAMMB ADMLS AEFGJ AEYWJ AGHNM AGXDD AGYGG AIDQK AIDYY JG9 7X8 |
ID | FETCH-LOGICAL-p2668-25fc5386def858d3be1954aa367ff8a3c11309be3db7084f460d6e9cc0ac49ad3 |
IEDL.DBID | DR2 |
ISSN | 0935-9648 1521-4095 |
IngestDate | Fri Jul 11 08:14:10 EDT 2025 Fri Jul 25 02:32:56 EDT 2025 Wed Jan 22 17:21:07 EST 2025 |
IsPeerReviewed | true |
IsScholarly | true |
Issue | 17 |
Language | English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-LOGICAL-p2668-25fc5386def858d3be1954aa367ff8a3c11309be3db7084f460d6e9cc0ac49ad3 |
Notes | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 14 content type line 23 |
ORCID | 0000-0001-7852-3811 |
PQID | 3044999811 |
PQPubID | 2045203 |
PageCount | 9 |
ParticipantIDs | proquest_miscellaneous_2854430301 proquest_journals_3044999811 wiley_primary_10_1002_adma_202304808_ADMA202304808 |
PublicationCentury | 2000 |
PublicationDate | 2024-04-01 |
PublicationDateYYYYMMDD | 2024-04-01 |
PublicationDate_xml | – month: 04 year: 2024 text: 2024-04-01 day: 01 |
PublicationDecade | 2020 |
PublicationPlace | Weinheim |
PublicationPlace_xml | – name: Weinheim |
PublicationTitle | Advanced materials (Weinheim) |
PublicationYear | 2024 |
Publisher | Wiley Subscription Services, Inc |
Publisher_xml | – name: Wiley Subscription Services, Inc |
References | 2014; 118 2017 2016; 139 26 2015; 6 2021; 5 2013; 25 2005; 152 2020; 63 2020; 142 2019; 13 2016; 30 2019; 18 2020; 14 2017; 29 2020; 11 2015; 9 2016; 16 2014 2018 2018 2018 2019 2022 2014; 14 17 10 10 31 13 8 2004 2017; 305 355 2013 2014 2016 2016 2017; 13 4 15 10 8 1996 1996; 54 6 1996; 77 1996; 105 2007; 317 1976; 13 2018 2019; 9 30 2020; 30 2018; 556 2019 2020; 10 142 2019; 25 2010; 132 2018; 30 1994; 50 |
References_xml | – volume: 13 start-page: 9958 year: 2019 publication-title: ACS Nano – volume: 14 start-page: 767 year: 2020 publication-title: ACS Nano – volume: 11 start-page: 3682 year: 2020 publication-title: Nat. Commun. – volume: 6 start-page: 6293 year: 2015 publication-title: Nat. Commun. – volume: 25 start-page: 28 year: 2019 publication-title: Mater. Today – volume: 105 start-page: 9982 year: 1996 publication-title: J. Chem. Phys. – volume: 152 start-page: J23 year: 2005 publication-title: J. Electrochem. Soc. – volume: 29 year: 2017 publication-title: Adv. Mater. – volume: 305 355 start-page: 972 year: 2004 2017 publication-title: Science Science – volume: 18 start-page: 1098 year: 2019 publication-title: Nat. Mater. – volume: 13 start-page: 6824 year: 2019 publication-title: ACS Nano – volume: 13 4 15 10 8 start-page: 6222 3957 48 8929 year: 2013 2014 2016 2016 2017 publication-title: Nano Lett. ACS Catal. Nat. Mater. ACS Nano Nat. Commun. – volume: 11 start-page: 57 year: 2020 publication-title: Nat. Commun. – volume: 77 start-page: 3865 year: 1996 publication-title: Phys. Rev. Lett. – volume: 10 142 start-page: 1584 4298 year: 2019 2020 publication-title: Nat. Commun. J. Am. Chem. Soc. – volume: 50 year: 1994 publication-title: Phys. Rev. B – volume: 30 start-page: 846 year: 2016 publication-title: Nano Energy – volume: 139 26 start-page: 4733 year: 2017 2016 publication-title: J. Am. Chem. Soc. Adv. Funct. Mater. – volume: 63 start-page: 1065 year: 2020 publication-title: Sci. China Mater. – volume: 556 start-page: 355 year: 2018 publication-title: Nature – volume: 9 30 start-page: 979 year: 2018 2019 publication-title: Nat. Commun. Nanotechnology – volume: 30 year: 2020 publication-title: Adv. Funct. Mater. – volume: 30 year: 2018 publication-title: Adv. Mater. – volume: 25 year: 2013 publication-title: J. Phys., Condens. Matter – volume: 13 start-page: 5188 year: 1976 publication-title: Phys. Rev. B – volume: 118 year: 2014 publication-title: J. Phys. Chem. C – volume: 9 start-page: 1520 year: 2015 publication-title: ACS Nano – volume: 54 6 start-page: 15 year: 1996 1996 publication-title: Phys. Rev. B Comput. Mater. Sci. – volume: 317 start-page: 100 year: 2007 publication-title: Science – volume: 16 start-page: 1097 year: 2016 publication-title: Nano Lett. – volume: 142 year: 2020 publication-title: J. Am. Chem. Soc. – volume: 14 17 10 10 31 13 8 start-page: 553 1108 1246 638 2193 year: 2014 2018 2018 2018 2019 2022 2014 publication-title: Nano Lett. Nat. Mater. Nat. Chem. Nat. Chem. Adv. Mater. Nat. Commun. ACS Nano – volume: 5 start-page: 28 year: 2021 publication-title: Nat. Electron. – volume: 132 year: 2010 publication-title: J. Chem. Phys. |
SSID | ssj0009606 |
Score | 2.5944562 |
Snippet | Emerging non‐noble metal 2D catalysts, such as molybdenum disulfide (MoS2), hold great promise in hydrogen evolution reactions. The sulfur vacancy is... Emerging non‐noble metal 2D catalysts, such as molybdenum disulfide (MoS2), hold great promise in hydrogen evolution reactions. The sulfur vacancy is... Emerging non-noble metal 2D catalysts, such as molybdenum disulfide (MoS2), hold great promise in hydrogen evolution reactions. The sulfur vacancy is... |
SourceID | proquest wiley |
SourceType | Aggregation Database Publisher |
StartPage | e2304808 |
SubjectTerms | 2D MoS2 Basal plane Catalytic activity Chemical vapor deposition Controllability Defects Density Hydrogen evolution reactions Ion adsorption Molybdenum disulfide Noble metals salt‐assisted Substrates Sulfur sulfur vacancies Sulfuric acid Two dimensional materials |
Title | Salt‐Induced High‐Density Vacancy‐Rich 2D MoS2 for Efficient Hydrogen Evolution |
URI | https://onlinelibrary.wiley.com/doi/abs/10.1002%2Fadma.202304808 https://www.proquest.com/docview/3044999811 https://www.proquest.com/docview/2854430301 |
Volume | 36 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwpV3NTsJAEN4YTnrw34iiWROvhf5sy_ZIBEJM8CBCuDX714umECgmePIRfASfxUfxSZxpSwGPemq3zSbd6czON7sz3xJy60rBpHZDSzncWCzQ3BIQN1sasHYzNEHscCxw7j8EvSG7H_vjjSr-nB-iXHBDy8jmazRwIeeNNWmo0BlvEC5q8qzaFxO2EBU9rvmjEJ5nZHueb4UB4yvWRtttbHffwpebKDVzM90DIlYfmGeXPNcXqayrt1_cjf8ZwSHZLzAobeVKc0R2THJM9jaYCU_IaCBe0u_3DzzZQxlNMR0Emm1Md0-XdCQUzsrwBAvzqdum_cnA_foEBEw7GSkF-DLaW-rZBBSUdl4LBT8lw27n6a5nFUcwWFPw3GBDfqxgSgy0ibnPtScNMsQJ4QXNOObCUw74wFAaZGm2OYtZYOvAhErZQrFQaO-MVJJJYs4JbRoV-iZ2bCMlU7YMFW6xekIDRJVwrZLa6hdEhR3NIxANhmTccarkpnwNFoDbGiIxk8U8whpQ5mFoVyVuJu9omjN1RDknsxuhpKNS0lGr3W-VrYu_dLoku3BfpPDUSCWdLcwVoJNUXmca-ANzi-Bf |
linkProvider | Wiley-Blackwell |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwpV3JTsMwELVQOQAHdkShgJG4ps3ipM6xoq3K0h5YKm6Wt1xAbVVSJDjxCXwC38Kn8CXMJGkLHOEU2ZGlZDzjeWPPPBNy4ivJlPFjR3vcOiwy3JEQNzsGsHY9tlHicSxw7vaizi07vwun2YRYC5PzQ8w23NAysvUaDRw3pGtz1lBpMuIg3NXkWO67iNd6Z1HV1ZxBCgF6RrcXhE4cMT7lbXT92s_xPxDmd5yaOZr2GlHTT8zzS-6rk1RV9csv9sZ__cM6WS1gKG3kerNBFuxgk6x8IyfcIv1r-ZB-vr7h5R7aGooZIdBsYsZ7-kz7UuPCDD1Ym0_9Ju0Or_2PdwDBtJXxUoA7o51nMx6CjtLWU6Hj2-S23bo57TjFLQzOCJw3mFGYaFgVI2MTHnITKIskcVIGUT1JuAy0B24wVhaJml3OEha5JrKx1q7ULJYm2CGlwXBgdwmtWx2HNvFcqxTTroo1nrIG0gBKVfAsk8p0DkRhSo8CRINRGfe8MjmevQYjwJMNObDDyaPAMlAWYHRXJn4mcDHKyTpETsvsC5S0mElaNJrdxqy195dBR2Spc9O9FJdnvYt9sgz9RUZPhZTS8cQeAFhJ1WGmjl99EOR6 |
linkToPdf | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwpV3JTsMwELVQkRAc2BFlNRLX0CxO6hwr0qosRQhoxc3ylguorSBFghOfwCfwLXwKX8JMkpbCEU6RHVlKxrM82zPPhBz6SjJl_NjRHrcOiwx3JKybHQNYux7bKPU4Fjh3LqJ2l53ehrdTVfwFP8Rkww0tI_fXaOBDk9a-SUOlyXmDcFOTY7XvLItcjnqdXH0TSCE-z9n2gtCJI8bHtI2uX_s5_gfAnIapeZxpLRE5_sIiveTuaJSpI_3yi7zxP7-wTBZLEEobhdaskBnbXyULU9SEa6R3Le-zz9c3vNpDW0MxHwSaCea7Z8-0JzW6ZejBynzqJ7QzuPY_3gEC02bOSgHBjLafzcMANJQ2n0oNXyfdVvPmuO2UdzA4QwjdYERhqsEnRsamPOQmUBYp4qQMonqachloD4JgrCzSNLucpTAJJrKx1q7ULJYm2CCV_qBvNwmtWx2HNvVcqxTTroo1nrEG0gBGVfCskp3xFIjSkB4FiAbXZNzzquRg8hpMAM81ZN8ORo8Ci0BZgGu7KvFzeYthQdUhClJmX6CkxUTSopF0GpPW1l8G7ZO5y6Qlzk8uzrbJPHSX6Tw7pJI9jOwuIJVM7eXK-AUEA-My |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Salt%E2%80%90Induced+High%E2%80%90Density+Vacancy%E2%80%90Rich+2D+MoS2+for+Efficient+Hydrogen+Evolution&rft.jtitle=Advanced+materials+%28Weinheim%29&rft.au=Man%2C+Ping&rft.au=Jiang%2C+Shan&rft.au=Ka+Ho+Leung&rft.au=Lai%2C+Ka+Hei&rft.date=2024-04-01&rft.pub=Wiley+Subscription+Services%2C+Inc&rft.issn=0935-9648&rft.eissn=1521-4095&rft.volume=36&rft.issue=17&rft_id=info:doi/10.1002%2Fadma.202304808&rft.externalDBID=NO_FULL_TEXT |
thumbnail_l | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0935-9648&client=summon |
thumbnail_m | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0935-9648&client=summon |
thumbnail_s | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0935-9648&client=summon |