The effect of deposition times in DC‐magnetron sputtering on micromorphology of TiO2 thin films

• Published in: Microscopy research and technique Vol. 84; no. 7; pp. 1475 - 1483
• Main Author: Rezaee, Sahar
• Format: Journal Article
• Language: English
• Published: Hoboken, USA John Wiley & Sons, Inc 01.07.2021; Wiley Subscription Services, Inc
• Subjects: Algorithms; Atomic force microscopy; Deposition; Fractal analysis; Magnetron sputtering; Mountains; multifractal analysis; Photovoltaic cells; Segmentation; surface texture; Thin films; TiO2 thin films; Titanium dioxide

TiO2 thin films have been prepared by DC‐magnetron sputtering process with various deposition times (8, 14, 16, and 20 min) and the micromorphology of their surface has been investigated by means of multifractal analysis. As the main purpose of the manuscript, the topography of all samples are exami...